Particle ALD (Atomic Layer Deposition) device / FORGE NANO Inc.
ALD (Atomic Layer Deposition) equipment dedicated to particles can deposit films on nanoscale particles.
The particle ALD (Atomic Layer Deposition) system for research and development can be utilized for various development purposes. It is capable of processing film formation on nanoscale particles from milligrams to kilograms. - Uniform control of film thickness using methods including fluidized beds - Three sizes of reactors with different capacities - Individual temperature control for multiple precursors - Ability to deposit various films on diverse particle materials - Easy creation of custom recipes and automated operation - Removable particle containers * There is also a lineup of equipment for mass production.
- Company：マツボー
- Price：Other
